发明名称 SUBSTRATE PROCESSING METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing method capable of precisely arranging the surface of a substrate at a target position for processing the substrate. <P>SOLUTION: The substrate processing method includes: a step for sequentially arranging a plurality of regions to be processed provided on the substrate to a process execution region, to detect a surface position of the substrate for each region; and a step for sequentially arranging the plurality of the regions to the process execution region, and adjusting a relative position between the surface of the substrate and a predetermined surface based on the detection result of the surface position, for each region, to carry out a predetermined process. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010050223(A) 申请公布日期 2010.03.04
申请号 JP20080211955 申请日期 2008.08.20
申请人 NIKON CORP 发明人 KATO MASANORI
分类号 H01L21/027 主分类号 H01L21/027
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