发明名称 WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY
摘要 An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.
申请公布号 US2010053841(A1) 申请公布日期 2010.03.04
申请号 US20080204079 申请日期 2008.09.04
申请人 MOMENTIVE PERFORMANCE MATERIALS INC. 发明人 RUSINKO, JR. DAVID MICHAEL;SCHAEPKENS MARC;ZENG WANXUE
分类号 H01L21/683 主分类号 H01L21/683
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