发明名称 |
DEFECT INSPECTION METHOD, AND DEFECT INSPECTION DEVICE |
摘要 |
<p>Provided are a defect inspection device and a defect inspecting method, which enlarge the uptake range of a light scattered from a fine defect thereby to heighten signal intensity. The defect inspection device is provided with: a stage unit (300) capable of mounting an inspection object substrate (1) thereon to move same relative to an optical device; an illuminating optical device (100) for illuminating an inspection zone (4) on the inspection object substrate (1); a detecting optical device (200) for detecting a light from the inspection zone (4) of the inspection object substrate (1); an image sensor (205) for converting the image focused by the detecting optical device (200) into signals; a signal processing unit (402) for processing the signals from the image sensor (205) thereby to detect a defect; and a plane reflecting mirror (501) arranged between detecting optical device (200) and the inspection object substrate (1) and transmitting the light from the inspection object substrate (1) to the detecting optical device (200).</p> |
申请公布号 |
WO2010024067(A1) |
申请公布日期 |
2010.03.04 |
申请号 |
WO2009JP63140 |
申请日期 |
2009.07.15 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION;CHIKAMATSU SHUICHI;NOGUCHI MINORI;OCHI MASAYUKI;AIKO KENJI |
发明人 |
CHIKAMATSU SHUICHI;NOGUCHI MINORI;OCHI MASAYUKI;AIKO KENJI |
分类号 |
G01N21/956;G01B11/30;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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