| 摘要 |
<p>PURPOSE: A reticle stage for a multi-correcting the amount of reticle rotation and a shift in exposure process and a multi-correcting method using thereof are provided to overcome limit of correction by correcting the amount of rotation and shift while being contacted to a first stage ad a reticle. CONSTITUTION: A reticle stage comprises a first stage(10) and a second stage(20). The first stage comprises a first adhesive unit(15). The first stage revolves in a horizontal direction. A first adhesive unit supports the reticle(1). The second stage comprises a second adhesive unit(25). The second adhesive unit passes through the first stage. The second adhesive unit supports the reticle.</p> |
