发明名称 INK COMPOSITION AND INKJET RECORDING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an ink composition which can be cured with high sensitivity upon irradiating with a radiation and can form an image having high image-quality with excellent adhesion to a medium to be recorded, and in particular suitable for inkjet recording, and to provide an inkjet recording method using the ink composition. <P>SOLUTION: The ink composition includes (A) a vinyl ether compound having a cyclic carbonate structure in the molecule, (B) a cationically polymerizable compound differing in structure from the vinyl ether compound (A), and (C) a compound generating an acid by irradiation with radiation. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010047737(A) 申请公布日期 2010.03.04
申请号 JP20080215808 申请日期 2008.08.25
申请人 FUJIFILM CORP 发明人 NAKAMURA IPPEI
分类号 B41J2/01;B41M5/00;C09D11/00;C09D11/38 主分类号 B41J2/01
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