发明名称 AG ALLOY SPUTTERING TARGET FOR FORMING SEMITRANSPARENT REFLECTION FILM OF OPTICAL RECORDING MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To provide an Ag alloy semitransparent reflection film of an optical recording medium such as an optical recording disk (CD-RW, DVD-RAM), and to provide an Ag alloy sputtering target for forming the semitransparent reflection film. <P>SOLUTION: The Ag alloy sputtering target for forming the semitransparent reflection film of the optical recording medium is formed of an Ag alloy which has a composition containing Eu of 0.2-1.5 mass% and having the residue consisting of Ag and inevitable impurities and has a structure in which fine Ag-Eu compound particles having a mean particle size of &le;20 &mu;m are dispersed in the base material. The semitransparent reflection film of the optical recording medium is obtained by sputtering using the Ag alloy sputtering target for forming the semitransparent reflection film and is formed of an Ag alloy which has a composition containing Eu of >0.1 and &le;0.8 mass% and having the residue consisting of Ag and inevitable impurities. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010049726(A) 申请公布日期 2010.03.04
申请号 JP20080211313 申请日期 2008.08.20
申请人 MITSUBISHI MATERIALS CORP 发明人 KOMIYAMA SHOZO
分类号 G11B7/258;C23C14/34;G11B7/24;G11B7/26 主分类号 G11B7/258
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