| 发明名称 |
Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate |
| 摘要 |
A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.
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| 申请公布号 |
US2010053574(A1) |
申请公布日期 |
2010.03.04 |
| 申请号 |
US20060911704 |
申请日期 |
2006.04.19 |
| 申请人 |
ASML HOLDING N.V.;ASML NETHERLANDS B.V. |
发明人 |
KHMELICHEK ALEKSANDR;SEWELL HARRY;MARKOYA LOUIS JOHN;LOOPSTRA ERIK ROELOF;TEN KATE NICOLAAS |
| 分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
| 代理机构 |
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