发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
申请公布号 US2010051806(A1) 申请公布日期 2010.03.04
申请号 US20090615955 申请日期 2009.11.10
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SASAKI YUKO;GUNJI YASUHIRO;CHENG ZHAOHUI
分类号 G01N23/225 主分类号 G01N23/225
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