发明名称 MOLD FOR NANO-IMPRINT, AND MAGNETIC RECORDING MEDIUM FABRICATED BY USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a mold to achieve an excellent S/N ratio in a magnetic recording medium after transfer of a pattern. <P>SOLUTION: The magnetic recording medium includes a substrate, an intermediate layer adjacent to the substrate, and a pattern formation layer adjacent to the intermediate layer and having a fine protruding and recessing pattern on its surface, wherein the intermediate layer is composed of an adhesive containing an ultraviolet ray transmitting silicone resin, and its elastic coefficient is smaller than that of the substrate and is smaller than that of the pattern formation layer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010049745(A) 申请公布日期 2010.03.04
申请号 JP20080213003 申请日期 2008.08.21
申请人 FUJI ELECTRIC DEVICE TECHNOLOGY CO LTD 发明人 UCHIDA SHINJI
分类号 G11B5/855;B29C33/38 主分类号 G11B5/855
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