发明名称 PLASMA TREATMENT APPARATUS FOR SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus for a substrate for ensuring stability or maintenance workability in marking for identifying a treated substrate. Ž<P>SOLUTION: In a plasma treatment apparatus 1 configured to house a substrate 5* treated by a plasma treatment unit 2c in a magazine 6B of an unloader device 4, a marking mechanism 8 for marking the substrate 5* by a pens 34 to indicate that the substrate has been plasma-treated, is disposed on a rear side of the unloader device 4, the pen 34 held by a pen holder 33 is horizontally moved to a side of the magazine 6B by a horizontal moving actuator 31, and for marking, a tip 34a of the pen is brought into contact with a distal end part at a side of a rear opening 6b on the substrate 5* housed in the magazine 6B. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010050366(A) 申请公布日期 2010.03.04
申请号 JP20080214937 申请日期 2008.08.25
申请人 PANASONIC CORP 发明人 NAGATOME RYUJI
分类号 H05K3/26;H05K3/00;H05K3/38 主分类号 H05K3/26
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