发明名称 LIGHTING SYSTEM, MANUFACTURING METHOD FOR LIGHTING SYSTEM, AND DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To solve a problem wherein a numerical aperture of a liquid crystal panel gets low to make low an intensity of a reflected light from the liquid crystal panel, and a problem wherein a display of low display brightness is provided thereby, since a reflecting layer reflects and shields also a light reflected by the liquid crystal panel, as the display including a lighting system using a bottom emission type organic EL device has the reflecting layer larger than a light emitting part, in order to surround a light emitting portion of the organic EL device for preventing a loss caused by a positional shift or the like, and for preventing a light of the light emitting part from getting incident directly into eyes of an observer. <P>SOLUTION: A counter substrate 200 is provided with the reflecting layer 210 for covering a light emitting area 163B of an element substrate 150 of the counter substrate 200, in its top view, using a photolithographic process. The reflecting layer 210 can be formed compactly by using the photolithographic process, and the light incident from a counter substrate 200 side is efficiently transmitted. The bright display of high numerical aperture is provided when combined with a reflecting type liquid crystal display. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010049957(A) 申请公布日期 2010.03.04
申请号 JP20080213635 申请日期 2008.08.22
申请人 SEIKO EPSON CORP 发明人 IKEHARA TADAYOSHI;KOMA TOKUO;TANASE KENJI;KARASAWA YASUSHI
分类号 F21S2/00;F21Y105/00;G02F1/13357;H01L51/50;H05B33/02;H05B33/04;H05B33/10;H05B33/12 主分类号 F21S2/00
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