发明名称 METHOD FOR FABRICATING NON-VOLATILE MEMORY
摘要 A method for fabricating a non-volatile memory is provided. The method includes a stacked structure and a consuming layer are formed in sequence over a substrate. A converting process is performed at a peripheral region of the consuming layer to form a first insulating layer. A conductive layer is formed over the stacked layer and the first insulating layer.
申请公布号 US2010055890(A1) 申请公布日期 2010.03.04
申请号 US20090615450 申请日期 2009.11.10
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 KUO MING-CHANG
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
主权项
地址