发明名称 UV ABSORPTION BASED MONITOR AND CONTROL OF CHLORIDE GAS STREAM
摘要 <p>A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber.</p>
申请公布号 WO2010023516(A1) 申请公布日期 2010.03.04
申请号 WO2009IB06355 申请日期 2009.07.21
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;BERTRAM, RONALD, THOMAS, JR.;ARENA, CHANTAL;WERKHOVEN, CHRISTIAAN, J.;TISCHLER, MICHAEL, ALBERT;VORSA, VASIL;JOHNSON, ANDREW, D. 发明人 BERTRAM, RONALD, THOMAS, JR.;ARENA, CHANTAL;WERKHOVEN, CHRISTIAAN, J.;TISCHLER, MICHAEL, ALBERT;VORSA, VASIL;JOHNSON, ANDREW, D.
分类号 C23C16/52;C23C16/30;C30B25/16;C30B29/40 主分类号 C23C16/52
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