发明名称 OPTICAL ELEMENT FOR GAS LASER AND GAS LASER APPARATUS USING THE SAME
摘要 At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
申请公布号 US2010054297(A1) 申请公布日期 2010.03.04
申请号 US20090545495 申请日期 2009.08.21
申请人 GIGAPHOTON INC. 发明人 WAKABAYASHI OSAMU;NAGAI SHINJI;KAKIZAKI KOUJI;TANAKA SATOSHI
分类号 H01S3/08 主分类号 H01S3/08
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