发明名称 |
Luminescent radiation measuring method for sawn coarse silicon wafer used to manufacture silicon solar cell, involves determining corrected intensity value so that measured reflection intensities are scaled with location-independent factor |
摘要 |
<p>The method involves measuring reflection intensities for each location point of a measuring side (1a) by a camera (2) e.g. charge coupled device camera. An excitation radiation reflected on the side is not or only partly suppressed by a filter unit (3) e.g. short pass filter. A corrected value of a luminescent radiation intensity is determined. The corrected intensity value is determined such that the measured reflection intensities are extracted from a measured intensity of a part of a radiation irradiated from the side and are scaled with a preset location-independent factor.</p> |
申请公布号 |
DE102008044883(A1) |
申请公布日期 |
2010.03.04 |
申请号 |
DE20081044883 |
申请日期 |
2008.08.29 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
GIESECKE, JOHANNES |
分类号 |
G01N21/63 |
主分类号 |
G01N21/63 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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