发明名称 MAGNETRON SPUTTER CATHODE, AND FILMING APPARATUS
摘要 <p>Disclosed is a magnetron sputter cathode comprising: a yoke (10); a magnetic circuit (20) including a center magnet (21), a peripheral magnet (22), auxiliary magnets (23, 23a, 23b and 25) and a parallel region (S); and a backing plate (30).  The center magnet (21), the peripheral magnet (22) and the auxiliary magnets (23, 23a, 23b and 25) are arranged so that the polarities of the individual tips (31, 32, 33a and 33b) of the center magnet (21), the peripheral magnet (22) and the auxiliary magnets (23, 23a, 23b and 25) may be different between the mutually adjacent magnets.  The magnetic field profile observed from above the backing plate (30) is set so that a magnetic flux density (B//) in a horizontal direction may take a positive value in a first region and a negative value in a second region across a position corresponding to the center magnet (21).</p>
申请公布号 WO2010023952(A1) 申请公布日期 2010.03.04
申请号 WO2009JP04240 申请日期 2009.08.28
申请人 ULVAC, INC.;TAKAHASHI, HIROHISA;YAMADA, SHINYA;ISHIBASHI, SATORU;SAKUMA, KOUHEI 发明人 TAKAHASHI, HIROHISA;YAMADA, SHINYA;ISHIBASHI, SATORU;SAKUMA, KOUHEI
分类号 C23C14/35;H01L21/203;H01L21/205;H01L21/285 主分类号 C23C14/35
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