| 摘要 |
A cleaning system for cleaning a surface comprising: a frame for the cleaning system; a liquid supply source; a liquid applicator; and at least one thruster on the frame to provide force against the frame to maintain support with the surface to be cleaned. A surface is cleaned by providing the cleaning device, moving the cleaning device both horizontally and vertically along the surface, and stabilizing the cleaning device with at least one thruster emitting a fluid stream comprising gas. |
