发明名称 |
SCAN EXPOSURE APPARATUS AND SUBSTRATE FOR LIQUID CRYSTAL DISPLAY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scan exposure apparatus in which masks can be replaced while reliably preventing interference with an air pad by a mask replacing mechanism having a relatively simple configuration, and to provide a substrate for a liquid crystal display. <P>SOLUTION: A mask changer 2 of a proximity scan exposure apparatus 1 includes: a mask tray 41 capable of mounting a mask M on its upper face; a drive belt mechanism 42 disposed at a position higher than an air pad 21 and driving the mask tray 41 in the Y-direction; and a translatory guiding mechanism 44 guiding the mask tray 41 in a translatory manner so as not to contact with the air pad 21 upon moving the mask tray 41 below a mask holding section 11. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010049015(A) |
申请公布日期 |
2010.03.04 |
申请号 |
JP20080213009 |
申请日期 |
2008.08.21 |
申请人 |
NSK LTD |
发明人 |
SAJI NOBUHITO;SUGIMOTO NORIYUKI |
分类号 |
G03F7/20;G02F1/13;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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