发明名称 |
ELECTROSTATIC DECHUCKING METHOD AND APPARATUS FOR DIELECTRIC WORKPIECE IN VACUUM PROCESSOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a dechucking method of an electrostatically chucked workpiece by preventing rupture and cracks. SOLUTION: A glass workpiece 32 is dechucked from a monopolar electrostatic chuck by gradually reducing the chucking voltage during processing while maintaining the voltage high enough to clamp the workpiece in a plasma processing chamber. The chucking voltage during processing is controlled in response to flow rate of a heat transfer fluid flowing to the chuck to maintain the chucking force and the flow rate approximately constant. A reverse polarity voltage applied to the chuck at the end of processing assists in dechucking. The workpiece temperature is maintained at a high value at the end of processing to assisting in dechucking. A peak current flowing through the chuck during workpiece lifting from the chuck controls the amplitude and/or duration of the reverse polarity voltage during the next dechucking operation. An inert plasma in the chamber removes a residual charge from the workpiece after workpiece lifting from the chuck. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010050463(A) |
申请公布日期 |
2010.03.04 |
申请号 |
JP20090206010 |
申请日期 |
2009.09.07 |
申请人 |
LAM RES CORP |
发明人 |
HOWALD ARTHUR M;HOLLAND JOHN P |
分类号 |
B23Q3/15;H01L21/683;H01L21/205;H01L21/302;H01L21/3065;H02N13/00 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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