| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern formation template cleaning method for effectively removing foreign substances remaining on the template for use in an imprinting method. Ž<P>SOLUTION: The template cleaning method comprises: holding the template 120 with an uneven pattern face; supplying a detergent 402 to an area including the foreign substance adhered to the pattern face of the template 120; performing irradiation of emitted light 105 from face of the template 120, opposite from the pattern face, and optically exciting the detergent 402 with the emitted light 105 to produce a radical; making at least a part of the foreign substance hydrophilic by reaction of the foreign substance with the radical; and removing the foreign substance from the template after the hydrophilic treatment. Thus, the resist residue 24 on the template 120 is removed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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