发明名称 RESIN COMPOSITION AND FILM OR COATING FILM FORMED USING RESIN THE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a resin composition which can form a low-dielectric constant polyimide film having heat-resistance and chemical resistance, and to provide a film or coating film formed by using the resin composition. Ž<P>SOLUTION: The resin composition contains an imido compound having an ethynyl group and a phenylene ether oligomer. A film or coating film is formed by using the resin composition. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010047704(A) 申请公布日期 2010.03.04
申请号 JP20080213911 申请日期 2008.08.22
申请人 FUJIFILM CORP 发明人 HAMADA KAZUHIRO;NAKAI YOSHIHIRO
分类号 C08L71/12;C08K5/3415 主分类号 C08L71/12
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