发明名称 METHOD AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE
摘要 A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped beam (VSB) charged particle beam writer is also disclosed, wherein the dosages of the shots may vary, and wherein the union of the shots is different than the set of target patterns. A method for forming circular patterns on a surface using a library of glyphs is also disclosed, wherein the glyphs are pre-calculated dosage maps that can be formed by one or more charged particle beam shots.
申请公布号 US2010055586(A1) 申请公布日期 2010.03.04
申请号 US20090540322 申请日期 2009.08.12
申请人 D2S, INC. 发明人 FUJIMURA AKIRA;TUCKER MICHAEL
分类号 G03F7/20;G03B27/42 主分类号 G03F7/20
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