发明名称 EPITAXIAL SUBSTRATE, SEMICONDUCTOR DEVICE SUBSTRATE, AND HEMT DEVICE
摘要 A buffer layer formed of Inx1Aly1Gaz1N formed on a base, with an upper part of the buffer layer containing columnar polycrystalline including a grain boundary existing in a direction substantially perpendicular to a surface of the base. The number of grain boundaries in the lower part of the buffer layer is greater than that in the upper part, and a full width at half maximum of an X-ray rocking curve of the upper part is 300-3000 seconds, RMS of the surface of the buffer layer is 0.2 nm-6 nm, and the ratio of the grain boundary width of the crystal grain of the upper part in a direction parallel to the base surface to the formation thickness of the buffer layer is 0.5-1.5.
申请公布号 US2010051961(A1) 申请公布日期 2010.03.04
申请号 US20090535859 申请日期 2009.08.05
申请人 NGK INSULATORS, LTD. 发明人 KURAOKA YOSHITAKA;MIYOSHI MAKOTO;SUMIYA SHIGEAKI;TANAKA MITSUHIRO
分类号 H01L29/778;H01L29/24 主分类号 H01L29/778
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