摘要 |
<p>Provided is a leakage detecting method of a process chamber, in which the ranges of a warning spec, a fault spec, and a PM spec for leakage detection having an effect upon leakage after PM is performed are expanded for a predetermined period or time until plasma is stabilized, considering that the states of parts significantly change before and after the PM is performed. Therefore, it is possible to accurately and quickly judge whether or not leakage occurs in a process chamber and to detect minute leakage.</p> |
申请人 |
SEMISYSCO CO., LTD.;LEE, SOON-JONG;WOO, BONG-JOO;KIM, HAK-KWON;KIM, TAE-DONG |
发明人 |
LEE, SOON-JONG;WOO, BONG-JOO;KIM, HAK-KWON;KIM, TAE-DONG |