发明名称 |
ELECTROSTATIC CHUCK AND VACUUM PROCESSING APPARATUS |
摘要 |
<p>Provided is an electrostatic chuck which can surely hold a translucent substrate to be processed even when an attracting force is deteriorated due to photoelectric effects, at the time of performing processing, including light irradiation, to the substrate by making the electrostatic chuck hold the substrate. An electrostatic chuck (6) is provided with a chuck plate (61) composed of a dielectric material, and a first electrode (631) and a second electrode (632) arranged on the chuck plate (61), and a voltage is applied to between the first and the second electrodes (631, 632), and a substrate (S) to be processed is attracted to a surface of the chuck plate (61). On one part of the surface of the chuck plate (61), a substrate holding section (64) composed of an adhesive sheet or the like having an adhesive force to the substrate (S) is arranged.</p> |
申请公布号 |
WO2010024146(A1) |
申请公布日期 |
2010.03.04 |
申请号 |
WO2009JP64415 |
申请日期 |
2009.08.17 |
申请人 |
ULVAC, INC.;SATOU, TADAYUKI;OKA, TADASHI;NAKAMURA, KYUZO |
发明人 |
SATOU, TADAYUKI;OKA, TADASHI;NAKAMURA, KYUZO |
分类号 |
H01L21/683;H02N13/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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