| 摘要 |
<p>PURPOSE: An apparatus for imprinting a fine structure is provided to prevent misalignment by projecting a light between a first chamber and a second chamber. CONSTITUTION: A micro-pattern imprinting apparatus comprises a first chamber(110), a second chamber(120), and a light source(300). The first chamber and the second chamber provide the process space. An imprint lithography is performed by using the stamp(M) through a process space. The stamp has a pattern on the substrate. The substrate is coated with the photo-curable polymer resin. The light source radiates the light between the first chamber and the second chamber.</p> |
