发明名称 Semiconductor Device
摘要 <p>The present invention provides a capacitor lower electrode (13a) formed on an adhesive layer (12) whose surface roughness is 0.79 nm or less, a ferroelectric layer (14a) having an ABO 3 perovskite structure, the (111) orientation of which is inclined from the perpendicular direction to the upper surface of the substrate (1) by 3.5° or less, and a capacitor upper electrode (15a).</p>
申请公布号 EP2159831(A1) 申请公布日期 2010.03.03
申请号 EP20090177096 申请日期 2003.10.30
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 TAKAMATSU, TOMOHIRO;WATANABE, JUNICHI;NAKAMURA, KO;WANG, WENSHENG;DOTE, AKI;NOMURA, KENJI;HORII, YOSHIMASA;KURASAWA, MASAKI;TAKAI, KAZUAKI;SATO, NAOYUKI
分类号 H01L21/316;H01L21/8238;H01L21/02;H01L21/8234;H01L21/8246;H01L27/06;H01L27/092;H01L27/10;H01L27/105 主分类号 H01L21/316
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