发明名称 |
GUIDE DEVICE AND CLEANING APPARATUS OF WAFER HAVING THE SAME |
摘要 |
PURPOSE: A guide device and a cleaning apparatus of a wafer having the same are provided to prevent the separation of a wafer slot by changing a wafer guide structure. CONSTITUTION: A guide apparatus is accommodated to a cleaning bath(10). The cleaning bath accepts a cleaning solution. The cleaning solution washes the wafer(1). The guide apparatus comprises a guide body(100) and a plurality of guides(200). The guide body is accepted inside the cleaning bath. A plurality of guides comprises a plurality of slots. A plurality of slots accepts a part of a plurality of wafers. The wafer is supported by the slot.
|
申请公布号 |
KR20100022854(A) |
申请公布日期 |
2010.03.03 |
申请号 |
KR20080081555 |
申请日期 |
2008.08.20 |
申请人 |
SILTRON INC. |
发明人 |
LEE, YU KYOUNG;CHO, HEUI DON;KANG, DAE YEUL;KIM, GWAN HO |
分类号 |
H01L21/304;H01L21/02 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|