发明名称 GUIDE DEVICE AND CLEANING APPARATUS OF WAFER HAVING THE SAME
摘要 PURPOSE: A guide device and a cleaning apparatus of a wafer having the same are provided to prevent the separation of a wafer slot by changing a wafer guide structure. CONSTITUTION: A guide apparatus is accommodated to a cleaning bath(10). The cleaning bath accepts a cleaning solution. The cleaning solution washes the wafer(1). The guide apparatus comprises a guide body(100) and a plurality of guides(200). The guide body is accepted inside the cleaning bath. A plurality of guides comprises a plurality of slots. A plurality of slots accepts a part of a plurality of wafers. The wafer is supported by the slot.
申请公布号 KR20100022854(A) 申请公布日期 2010.03.03
申请号 KR20080081555 申请日期 2008.08.20
申请人 SILTRON INC. 发明人 LEE, YU KYOUNG;CHO, HEUI DON;KANG, DAE YEUL;KIM, GWAN HO
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
代理机构 代理人
主权项
地址