| 发明名称 |
DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUTPUT OR ADJUSTING THE SAME UPWARDS |
| 摘要 |
|
| 申请公布号 |
EP1110237(B1) |
申请公布日期 |
2010.03.03 |
| 申请号 |
EP20000951213 |
申请日期 |
2000.06.16 |
| 申请人 |
ROBERT BOSCH GMBH |
发明人 |
BECKER, VOLKER;LAERMER, FRANZ;SCHILP, ANDREA;BECK, THOMAS |
| 分类号 |
H01L21/3065;H05H1/46;C30B33/12;H01J37/32;H01L21/302;H01L21/308 |
主分类号 |
H01L21/3065 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
