发明名称 |
APPARATUS FOR FORMING A NANO-PATTERN AND METHOD FOR FORMING A NANO-PATTERN |
摘要 |
<p>PURPOSE: An apparatus for forming a nano-pattern and a method for forming a nano-pattern are provided to an excellent micro-pattern by pressing a stamp and a substrate through pressure difference. CONSTITUTION: A fine pattern formation apparatus(100) comprises chambers(111,113), a stage(140), a stamp lifting unit(160), and a stamp presser portion(170). The chamber forms a process space. The stage supports the substrate(10). The pattern film is formed on the substrate. The stamp lifting unit supports the edge part of the stamp(20). The stamp lifting unit raises the stamp. The stamp presser portion pressurizes the edge part of the stamp.</p> |
申请公布号 |
KR20100022817(A) |
申请公布日期 |
2010.03.03 |
申请号 |
KR20080081505 |
申请日期 |
2008.08.20 |
申请人 |
ADP ENGINEERING CO., LTD. |
发明人 |
CHOI, JUNG SU;LIM, YONG JIN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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