发明名称 APPARATUS FOR FORMING A NANO-PATTERN AND METHOD FOR FORMING A NANO-PATTERN
摘要 <p>PURPOSE: An apparatus for forming a nano-pattern and a method for forming a nano-pattern are provided to an excellent micro-pattern by pressing a stamp and a substrate through pressure difference. CONSTITUTION: A fine pattern formation apparatus(100) comprises chambers(111,113), a stage(140), a stamp lifting unit(160), and a stamp presser portion(170). The chamber forms a process space. The stage supports the substrate(10). The pattern film is formed on the substrate. The stamp lifting unit supports the edge part of the stamp(20). The stamp lifting unit raises the stamp. The stamp presser portion pressurizes the edge part of the stamp.</p>
申请公布号 KR20100022817(A) 申请公布日期 2010.03.03
申请号 KR20080081505 申请日期 2008.08.20
申请人 ADP ENGINEERING CO., LTD. 发明人 CHOI, JUNG SU;LIM, YONG JIN
分类号 H01L21/027 主分类号 H01L21/027
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