发明名称 |
NITRIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A nitride semiconductor substrate and a manufacturing method thereof are provided to manufacture a excellent nitride semiconductor substrate by shielding an electric wave with a mask layer and a sphere ball. CONSTITUTION: In a nitride semiconductor substrate and a manufacturing method thereof, a mask layer(30) grows on a material substrate(10). The mask layer has an irregular cluster type. The mask layer shields the electric potential electric wave. The nitride semiconductor layer is formed on the substrate. The mask layer is comprised of siN and mgN or ZnN.
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申请公布号 |
KR20100022663(A) |
申请公布日期 |
2010.03.03 |
申请号 |
KR20080081283 |
申请日期 |
2008.08.20 |
申请人 |
SILTRON INC. |
发明人 |
KIM, JI HOON;LEE, HO JUN;KIM, JI WON;JEON, SU IN |
分类号 |
H01L21/20;H01L21/268 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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