| 摘要 |
Process for preparing a silicon dioxide granule having a specific surface area of less than 1 m/g and a proportion of impurities of less than 50 ppm, in which a) a silicon dioxide powder with a tamped density of 15 to 190 g/l, b) is compacted to slugs which are subsequently crushed, the slug fragments having a tamped density of 210 to 800 g/l, and c) the slug fragments are treated with one or more reactive compounds at 400 to 1100 °C.
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