发明名称 |
WAFER BAKING DEVICE OF A SEMICONDUCTOR MANUFACTURING EQUIPMENT |
摘要 |
PURPOSE: A wafer baking device of a semiconductor manufacturing apparatus is provided to prevent a defective pattern at end of a wafer in a backing process of a photosensitive pattern by using a chemical sensitizer. CONSTITUTION: A baking device comprises a baking plate(10) and a heating control apparatus(20). The baking plate mounts an object. The baking plate comprises a plurality of heating coils. The heating control apparatus independently controls the heating of a plurality of heating coils. The baking plate comprises a first heating coil(12) and a second heating coil(14).
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申请公布号 |
KR20100022276(A) |
申请公布日期 |
2010.03.02 |
申请号 |
KR20080080878 |
申请日期 |
2008.08.19 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KIM, HAK JOON;RYU, HAE WOOK |
分类号 |
H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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