发明名称 WAFER BAKING DEVICE OF A SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE: A wafer baking device of a semiconductor manufacturing apparatus is provided to prevent a defective pattern at end of a wafer in a backing process of a photosensitive pattern by using a chemical sensitizer. CONSTITUTION: A baking device comprises a baking plate(10) and a heating control apparatus(20). The baking plate mounts an object. The baking plate comprises a plurality of heating coils. The heating control apparatus independently controls the heating of a plurality of heating coils. The baking plate comprises a first heating coil(12) and a second heating coil(14).
申请公布号 KR20100022276(A) 申请公布日期 2010.03.02
申请号 KR20080080878 申请日期 2008.08.19
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, HAK JOON;RYU, HAE WOOK
分类号 H01L21/324 主分类号 H01L21/324
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