发明名称 Junction barrier Schottky (JBS) with floating islands
摘要 A Schottky diode includes a Schottky barrier and a plurality of dopant regions disposed near the Schottky barrier as floating islands to function as PN junctions for preventing a leakage current generated from a reverse voltage. At least a trench opened in a semiconductor substrate with a Schottky barrier material disposed therein constitutes the Schottky barrier. The Schottky barrier material may also be disposed on sidewalls of the trench for constituting the Schottky barrier. The trench may be filled with the Schottky barrier material composed of Ti/TiN or a tungsten metal disposed therein for constituting the Schottky barrier. The trench is opened in a N-type semiconductor substrate and the dopant regions includes P-doped regions disposed under the trench constitute the floating islands. The P-doped floating islands may be formed as vertical arrays under the bottom of the trench.
申请公布号 US7671439(B2) 申请公布日期 2010.03.02
申请号 US20060607583 申请日期 2006.12.01
申请人 ALPHA & OMEGA SEMICONDUCTOR, LTD. 发明人 PAN JI;BHALLA ANUP
分类号 H01L29/47 主分类号 H01L29/47
代理机构 代理人
主权项
地址