Asymmetric bis-silanes and methods for making and their use

摘要

An asymmetric bis-silane compound of the formula A3Si—R1—SiB3 where A, B, and R1 are as defined herein, and to methods for making the bis-silane compound and their use to form layers or films of metal oxide particles, and which layers or films adhere to a suitable substrate. The materials and methods can be used, for example, to make photoactive devices.