发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation source can generate a high-quality and stable radiation output, using a radiation beam. <P>SOLUTION: The radiation source includes a beam generator for generating a radiation beam used to generate the radiation output of the radiation source, and a beam monitor for monitoring the radiation beam. The radiation source is included in a lithographic apparatus. The device manufacturing method includes generating a first type radiation using a second-type radiation beam, monitoring the quality of the second-type radiation and projecting the radiation beam with a first-type pattern onto a substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010045354(A) |
申请公布日期 |
2010.02.25 |
申请号 |
JP20090182956 |
申请日期 |
2009.08.06 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
LOOPSTRA ERIK ROELOF;VAN SCHOOT JAN BERNARD PLECHELMUS;SWINKELS GERARDUS HUBERTUS PETRUS MARIA |
分类号 |
H01L21/027;G03F7/20;H01J61/62;H05G2/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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