| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that, though a conventional projection-type ion beam processor can perform large-area high-speed ion beam processing, it has difficulty in securing an ion beam current in microfabrication requiring high-resolution processing, and cannot simultaneously achieve large-area high-speed ion beam processing and microfabrication, and to provide a projection-type ion beam processor that simultaneously achieves large-area high-speed ion beam processing and microfabrication. Ž<P>SOLUTION: From an ion source toward a sample stage, a first lens, a first mask mechanism, a second lens, a second mask mechanism, and a third lens are arranged in this order. The first mask mechanism has a projection opening for high-speed processing, and the first and second mask mechanisms have long and narrow rectangular openings for microfabrication. This enables achieving high-speed processing and microfabrication simultaneously. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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