METHOD FOR CLEANING COMPONENTS OF SEMICONDUCTOR EQUIPMENT AND APPARATUS FOR CLEANING COMPONENTS OF SEMICONDUCTOR EQUIPMENT USING THE SAME

摘要

Provided are a method for cleaning components of semiconductor equipment and an apparatus for cleaning components of semiconductor equipment using the same. The method according to the prevent invention comprises: a step (a) for applying a surface treatment liquid to the components of the semiconductor equipment to be cleaned, and a step (b) for plasma-cleaning the components in a reaction chamber. The method enables economical cleaning for the components of the semiconductor equipment, and especially allows the very efficient removal of organic or inorganic substances that cohere on the components of worn out semiconductor equipment. Therefore, the life spans of the components used in the equipment can be extended. In addition, the economical efficiency of the equipment can be enhanced through the reuse of the components.