发明名称 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
摘要 A thin film transistor is formed by laminating a gate electrode 3, a gate insulating film(4), a channel layer(5), and source/drain layers(7),(8) on a substrate(2) in this order or in a reversed order thereof. The thin film transistor is characterized in that the source/drain layers(7), (8) contain impurities having a concentration gradient such that a concentration becomes lower toward the channel layer(5). The thin film transistor which can increase an on/off ratio, manufacture method thereof, and a display device are provided.
申请公布号 US2010044709(A1) 申请公布日期 2010.02.25
申请号 US20080303287 申请日期 2008.03.19
申请人 SONY CORPORATION 发明人 NAKAYAMA TETSUO;ARAI TOSHIAKI
分类号 H01L33/00;H01L21/336;H01L29/786 主分类号 H01L33/00
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