| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a diffraction optical element capable of redistributing incoming radiation beams more uniformly on an output plane, a lithographic apparatus, and a manufacturing method of a semiconductor device. <P>SOLUTION: The diffraction optical element and the lithographic apparatus with the diffraction optical element cause radiation beams to be diffracted on an output plane. The diffraction optical element comprises a plurality of unit gratings each having such a phase structure as to adjust a cross section intensity distribution of the incoming radiation beam to be a desired intensity distribution. The unit gratings of the diffraction optical element are arranged adjacently to have such phase structures corresponding to each other in a mirror image or a reversal image. In addition, the manufacturing method of the semiconductor device is presented. <P>COPYRIGHT: (C)2010,JPO&INPIT |
