发明名称 |
PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY |
摘要 |
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.
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申请公布号 |
US2010048848(A1) |
申请公布日期 |
2010.02.25 |
申请号 |
US20070519371 |
申请日期 |
2007.12.20 |
申请人 |
MARUZEN PETROCHEMICAL CO., LTD. |
发明人 |
YAMAGISHI TAKANORI;KATO ICHIRO;YAMAGUCHI SATOSHI;OSAKI KOUZO;SHIBATA YASUO;MAGARA ISAO;OMORI HIDEKI;IUCHI KENSUKE |
分类号 |
C08F224/00 |
主分类号 |
C08F224/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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