发明名称 Metal Deposition
摘要 Systems and methods include depositing one or more materials on a voltage switchable dielectric material. In certain aspects, a voltage switchable dielectric material is disposed on a conductive backplane. In some embodiments, a voltage switchable dielectric material includes regions having different characteristic voltages associated with deposition thereon. Some embodiments include masking, and may include the use of a removable contact mask. Certain embodiments include electrografting. Some embodiments include an intermediate layer disposed between two layers.
申请公布号 US2010044080(A1) 申请公布日期 2010.02.25
申请号 US20090608326 申请日期 2009.10.29
申请人 KOSOWSKY LEX 发明人 KOSOWSKY LEX
分类号 H05K1/00;C25D5/00;C25D5/02;C25D5/48 主分类号 H05K1/00
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