发明名称 PROCESS FOR DEPOSITING AN ELECTRICALLY CONDUCTIVE LAYER AND ASSEMBLY OF THE LAYER ON A POROUS SUPPORT SUBSTRATE
摘要 A process for depositing an electrically conductive, preferably perovskitic layer uses a pulsed sputtering process. The layer has a low diffusivity for the elements in the iron group and is especially suitable for use in solid oxide fuel cells (SOFC). An assembly of the electrically conductive ceramic layer on a porous support substrate is also provided.
申请公布号 US2010047565(A1) 申请公布日期 2010.02.25
申请号 US20090349735 申请日期 2009.01.07
申请人 PLANSEE SE 发明人 KAILER KARL;KUNSCHERT GEORG;SCHLICHTHERLE STEFAN;STRAUSS GEORG
分类号 B32B15/04;C23C14/34 主分类号 B32B15/04
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