| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thermal treatment apparatus can prevent discoloration of a holding plate during flash light irradiation. Ž<P>SOLUTION: A quartz susceptor 72 is mounted on a top face of a hot plate 71, and a semiconductor wafer W is mounted on a top face of the susceptor 72. Diameters of the hot plate 71 and the susceptor 72 are larger than a diameter of the semiconductor wafer W. A shading ring 75 is mounted on a rim part of the susceptor 72 of an outer side than the semiconductor wafer W. The shading ring 75 covers a circular area of an outer side than an area covered by the semiconductor wafer W of the top face of the hot plate 71. Accordingly, substantially the whole of the top face of the hot plate 71 is shielded from flash light of a flash lamp FL by the semiconductor wafer W and the shading ring 75. As a result, discoloration due to oxidation of the hot plate 71 is prevented during irradiation of the flash light. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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