RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COMPOUND AND ACID GENERATOR

摘要

PROBLEM TO BE SOLVED: To provide: a novel compound useful as an acid generator for a resist composition; an acid generator using the compound; a resist composition including the acid generator; and a method of forming a resist pattern using the resist composition.

SOLUTION: The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) including a compound represented by general formula (b1-1), wherein: Z represents a single bond or a divalent linking group; R11"to R13"each independently represents an organic group having a fluorine atom; r1to r3each independently represents an integer of 0-3, provided that r1+r2+r3≠0; R14"to R16"each independently represents alkyl, acetyl, alkoxy, carboxy, hydroxy, hydroxyalkyl or a halogen atom; r4to r6each independently represents an integer of 0-3, provided that r1+r4≤5, r2+r5≤4 and r3+r6≤4; any two among R11"to R16"may be bonded to each other to form a ring; when a plurality of symbols R11"to R16"are present, the symbols R11"to R16"may be the same or different, respectively; and X-is an anion.

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