发明名称 PRESSURE REGULATION VALVE FOR MANUFACTURING SEMICONDUCTOR ELEMENTS AND SEMICONDUCTOR ELEMENT MANUFACTURING DEVICE EQUIPPED WITH THE VALVE
摘要 <P>PROBLEM TO BE SOLVED: To provide a pressure regulation valve for manufacturing semiconductor elements capable of regulating a pressure inside a reaction vessel by one valve in the manufacture of the semiconductor elements, whose pressure regulation range is wide, and capable of preventing the rising of foreign particles inside the reaction vessel, and to provide a semiconductor element manufacturing device equipped with the valve. Ž<P>SOLUTION: This pressure regulation valve 21 includes a cylindrical body 33, a valve body 34, and a valve drive part 37. The cylindrical body 33, in which a space inside the cylindrical body 33 is formed, has an opening 36 and a valve seat 35. The opening 36 is open to an external space. The cross-sectional shape perpendicular to the displacement direction Z of the valve body 34 is formed in a circular shape, while the valve body 34 is formed in a tapered shape from the space inside the cylindrical body 33 toward the valve seat 35. The diameter at the tip end at the valve seat 35 side of the valve body 34 is set smaller than the inside diameter of the valve port formed in the valve seat 35. The valve drive part 37 displaces the valve body 34 in the displacement direction Z. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010043655(A) 申请公布日期 2010.02.25
申请号 JP20080206275 申请日期 2008.08.08
申请人 SHARP CORP 发明人 KAWAGUCHI YOSHIHIRO
分类号 F16K1/38;C23C16/44;F16K51/02;H01L21/3065 主分类号 F16K1/38
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