发明名称 Method for producing single side contactable solar cell from semiconductor substrate with n-doping, involves producing n-doped base high doping area at base contacting area in semiconductor substrate
摘要 <p>The method involves producing an n-doped base high doping area (3) at a base contacting area (4) in a semiconductor substrate (1). A p-doped emitter layer (5) is applied on an emitter side (2) of the semiconductor substrate or on multiple emitter side covering intermediate layers, to form a pn-transition with the semiconductor substrate. An independent claim is included for a solar cell, for a single side contacting, which has an n-doped semiconductor substrate.</p>
申请公布号 DE102009040670(A1) 申请公布日期 2010.02.25
申请号 DE20091040670 申请日期 2009.09.09
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 HERMLE, MARTIN;BIVOUR, MARTIN;REICHEL, CHRISTIAN
分类号 H01L31/18;H01L31/0224;H01L31/068 主分类号 H01L31/18
代理机构 代理人
主权项
地址