| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a resist composition that can form a resist pattern of good shape; a method of forming a resist pattern; an acid generator for the resist composition; and a novel compound useful as the acid generator. <P>SOLUTION: The resist composition includes a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1), wherein: Y<SP>1</SP>represents 1-4C fluorinated alkylene; X represents a 3-30C aliphatic cyclic group; and R<SP>11'</SP>to R<SP>13'</SP>each represents aryl or alkyl, provided that at least one of R<SP>11'</SP>to R<SP>13'</SP>is aryl having a substituent represented by general formula (b1-0) (wherein R<SP>52</SP>represents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1), and two alkyl groups among R<SP>11'</SP>to R<SP>13'</SP>may be bonded to each other to form a ring with the sulfur atom in the formula. <P>COPYRIGHT: (C)2010,JPO&INPIT |
