发明名称 RADIATION-SENSITIVE COMPOSITION FOR FORMING LIGHT-SHIELDING FILM, LIGHT-SHIELDING FILM FOR SOLID-STATE IMAGE SENSOR, AND SOLID-STATE IMAGE SENSOR
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming a light-shielding film capable of forming a light-shielding film excellent in light-shielding performance and bondability on the surface of an insulation and enabling the obtained light-shielding film to maintain the above performance even in a condition ranging from a low temperature to a high temperature and high humidity, in a solid-state image sensor with a photoelectric conversion unit on one surface side, an electrode on the other surface side and the insulation disposed on the circumferential edge of the electrode, to provide a light-shielding film for a solid-state image sensor, and to provide a solid-state image sensor. SOLUTION: The radiation-sensitive composition for forming a light-shielding film is used to form a light-shielding film on the circumferential edge of an effective pixel region of the solid-state image sensor. The composition contains: a black pigment, a modified acrylic block polymer having acid number of 15-40 mgKOH/g and amine number of 25-40 mgKOH/g, an alkali-soluble resin having a repetitive structure unit derived from N-phenylmaleimide, a polyfunctional monomer, and an acetophenone-based photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010045192(A) 申请公布日期 2010.02.25
申请号 JP20080208157 申请日期 2008.08.12
申请人 JSR CORP 发明人 NARUSE SHINGO;SHIMADA NOBUKO
分类号 H01L27/14 主分类号 H01L27/14
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