发明名称 Apparatus for aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
摘要 The apparatus includes a particle beam, having an axis which functions as a primary optical axis, which particle beam is used to generate a pattern on a substrate. The apparatus also includes an optical reader, having an axis which functions as a secondary optical axis. A position fiducial is located at a stationary position relative to the substrate. Registration of a pre-existing pattern and the particle beam axis to the position fiducial periodically during production of a particle-beam-generated pattern continually provides an improvement in the overall alignment of the pattern being created with the pre-existing pattern on the substrate.
申请公布号 US2010044594(A1) 申请公布日期 2010.02.25
申请号 US20090589479 申请日期 2009.10.22
申请人 APPLIED MATERIALS, INC. 发明人 SULLIVAN JEFFREY S.;YOUNG TONY TIECHENG
分类号 G03F9/00;G21G5/00 主分类号 G03F9/00
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